Ion Implantation Profile Calculator/Graph

Select Desired Number of Implants	1 2 3 4 5 6 7
Substrate:	Si   Amorphous Si   SiO2   Si3N4
Dopant:	Arsenic   Boron   Phosphorus
Ion Energy:	[keV] (0-200)
Ion Dose:	[ions/cm2]
Substrate Depth (x):	[µm]
Ion Concentration at x:	[atoms/cm3]
Click here for a list of Ion Implantation Houses.

Impurity Concentration
vs. Substrate Depth
for above Parameters